Figure 1.

Thin-film strategies for volume-change-accommodating electrode. a) Relationship between the critical crack spacing (L_cr) in the Si film and critical size of Si patches (L) against interfacial delamination. Plastic localization inside Si patches induces interfacial delamination when L is larger than L_cr which is calculated as 5.1–8.9 μm with 100 nm of thickness.[20] b) Behavior of honeycomb patterns during lithiation/delithiation.[21] c) SEM images of alumina coated patterns before and after 1st lithiation in top view.[22] Reprinted with permission from Refs. [20,22]]. Copyright 2011 Elsevier B.V; Copyright, 2011 John Wiley & Sons, Inc.; Copyright, 2011 John Wiley & Sons, Inc.