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. 2017 May 8;7:46799. doi: 10.1038/srep46799

Corrigendum: Hexagonal Boron Nitride Tunnel Barriers Grown on Graphite by High Temperature Molecular Beam Epitaxy

Yong-Jin Cho, Alex Summerfield, Andrew Davies, Tin S Cheng, Emily F Smith, Christopher J Mellor, Andrei N Khlobystov, C Thomas Foxon, Laurence Eaves, Peter H Beton, Sergei V Novikov
PMCID: PMC5421103  PMID: 28480901

Scientific Reports 6: Article number: 34474; 10.1038/srep34474 published online: September 29 2016; updated: May 08 2017.

As the authors of references 25 and 26 also employed plasma-assisted molecular beam epitaxy for the synthesis of hexagonal boron nitride films, the authors would like to make the following changes to the Introduction section of their Article:

“In addition the direct growth of hBN on a two-dimensional material (HOPG) offers an alternative to chemical vapour deposition23,24,25,26 and atomic layer deposition27 of hBN on metal substrates; this approach must typically be complemented by complex protocols for the removal and transfer of the grown films”.

Should read:

“In addition the direct growth of hBN on a two-dimensional material (HOPG) offers an alternative to chemical vapour deposition23,24, MBE25,26 and atomic layer deposition27 of hBN on metal substrates; this approach must typically be complemented by complex protocols for the removal and transfer of the grown films”.


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