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. Author manuscript; available in PMC: 2018 Feb 1.
Published in final edited form as: Optica. 2017 Feb 2;4(2):193–203. doi: 10.1364/OPTICA.4.000193

Fig. 2.

Fig. 2

Si3N4 microring dispersion and experimental setup. (a) Calculated dispersion of a 23 μm radius Si3N4 microring for a fixed thickness of 600 nm and varied ring widths. The inset shows the corresponding integrated dispersion. (b) Experimental setup. AWG, arbitrary waveform generator; ECDL, external cavity diode laser; FPC, fiber polarization rotator; EDFA, erbium-doped fiber amplifier; TBPF, tunable bandpass filter; PD, photodetector; DAQ, data acquisition; OSA, optical spectrum analyser; ESA, electronic spectrum analyzer. The zoom-in figure of the chip shows a scanning-electron micrograph of the microring.