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. 2021 Mar 24;11:7157. doi: 10.1038/s41598-021-86624-1

Author Correction: Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry

Ufuk Kilic 1,, Alyssa Mock 1, Derek Sekora 1, Simeon Gilbert 3, Shah Valloppilly 2, Giselle Melendez 4, Natale Ianno 1, Marjorie Langell 5, Eva Schubert 1, Mathias Schubert 1,6,7,
PMCID: PMC7990909  PMID: 33762652

Correction to: Scientific Reports 10.1038/s41598-020-66409-8, published online 25 June 2020

Giselle Melendez was omitted from the author list in the original version of this Article. This has now been corrected in the PDF and HTML versions of the Article, and in the accompanying Supplementary Information file.

The Author Contributions section now reads:

U.K. and D.S. performed ALD depositions of Al2O3, SiO2, TiO2, and WO3 thin films. U.K. took AFM images, collected in-situ SE data and designed the dynamic dual box model for in-situ SE data analysis. A.M. and G.M. contributed to the SE data analysis. S.V. and U.K. performed XRD analysis. S.G. and U.K. performed XPS analysis. N.I. and M.L. made contributions to the discussions over the experimental results. The manuscript was edited and approved by all authors. E.S. and M.S. supervised the project.

Contributor Information

Ufuk Kilic, Email: ufuk.kilic@huskers.unl.edu.

Mathias Schubert, Email: schubert@engr.unl.edu.


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