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. 2022 Feb 14;9(12):nwac020. doi: 10.1093/nsr/nwac020

Room-temperature third-order nonlinear Hall effect in Weyl semimetal TaIrTe4

Cong Wang 1,2,c, Rui-Chun Xiao 3,c, Huiying Liu 4, Zhaowei Zhang 5, Shen Lai 6, Chao Zhu 7, Hongbing Cai 8, Naizhou Wang 9, Shengyao Chen 10, Ya Deng 11, Zheng Liu 12, Shengyuan A Yang 13,, Wei-Bo Gao 14,15,
PMCID: PMC9869080  PMID: 36694799

Abstract

The second-order nonlinear Hall effect observed in the time-reversal symmetric system has not only shown abundant physical content, but also exhibited potential application prospects. Recently, a third-order nonlinear Hall effect has been observed in MoTe2 and WTe2. However, few-layer MoTe2 and WTe2 are usually unstable in air and the observed third-order nonlinear Hall effect can be measured only at low temperature, which hinders further investigation as well as potential application. Thus, exploring new air-stable material systems with a sizable third-order nonlinear Hall effect at room temperature is an urgent task. Here, in type-II Weyl semimetal TaIrTe4, we observed a pronounced third-order nonlinear Hall effect, which can exist at room temperature and remain stable for months. The third-order nonlinear Hall effect is connected to the Berry-connection polarizability tensor instead of the Berry curvature. The possible mechanism of the observation of the third-order nonlinear Hall effect in TaIrTe4 at room temperature has been discussed. Our findings will open an avenue towards exploring room-temperature nonlinear devices in new quantum materials.

Keywords: topological material, third-order nonlinear Hall effect, room temperature, Berry connection polarizability tensor


In a type-II Weyl semimetal TaIrTe4, the pronounced 3rd order nonlinear Hall effect signal has been observed, which can exist at room temperature and remain stable for months.

INTRODUCTION

Recently, the nonlinear Hall effect that does not need the magnetic field has been observed in non-magnetic quantum materials. The frequency conversion metric is gradually becoming a hot research topic in condensed matter physics [1–6]. One important physical mechanism of the second-order nonlinear Hall effect is attributed to the Berry curvature dipole [1]. The Berry curvature and the Berry curvature dipole also help us to have a deeper understanding of several other physical phenomena, such as quantum Hall effect [7–10], orbital magnetization [11], gyrotropic Hall effect [12,13] and circular photogalvanic effect (CPGE) [14,15]. Besides, the Berry curvature dipole can introduce a Drude-like nonlinear optical process in non-centrosymmetric metal [16], and generate the nonlinear Nernst effect [17,18]. The nonlinear Hall effect has promising applications, such as high-frequency rectification [19], energy harvesting, wireless communications and infrared detectors [20], Berry curvature memory [21], electrical detection of ferroelectric-like metals [22] and two-dimensional piezoelectric-like devices [23]. Due to the large local Berry curvature and broken inversion symmetry, Weyl semimetals (WSMs) are expected to be ideal platforms to study the nonlinear Hall effect [24,25].

Beyond the second-order Hall effect, the higher-order nonlinear Hall effect is currently under active research, which will help us uncover new fundamental physical mechanisms and new applications. Particularly, the third-order Hall effect can dominate in non-magnetic centrosymmetric materials, where both linear and second-order Hall effects are suppressed. Recently, the third-order nonlinear Hall effect in MoTe2 and WTe2 was successfully detected [26]. It is further revealed that the physical mechanism of the third-order Hall effect is connected to the so-called Berry-connection polarizability (BCP) tensor [27,28], which is distinct from the second-order Hall effect. Thus, the third-order Hall effect offers a new characterization tool for a large class of materials and probes a new intrinsic band structure property.

However, it is noted that both MoTe2 and WTe2 are unstable in air, and the signals can only be detected at low temperatures, which severely limits their possible applications. Finding new material systems with air stability and sizable third-order Hall effect at room temperature is much desired. From the previous analysis [26,28], it is found that like Berry curvature, the BCP contribution is also pronounced around the band near degeneracies. Therefore, WSMs could be good candidates for exploring the sizable third-order Hall effect. As an important type-II WSM, TaIrTe4 [29,30] hosts the minimal number of Weyl points in all reported WSMs [31] and more importantly it is stable in air [32]. Therefore, exploring the third-order Hall effect in this material is meaningful for scientific research and practical application.

In this paper, we study the third-order nonlinear Hall effect of TaIrTe4 through transport measurements and symmetry analysis. We find two important characteristics of the third-order nonlinear Hall effect observed in TaIrTe4 compared to that observed in MoTe2 and WTe2 [26]: (i) the third-order nonlinear signals in TaIrTe4 are very robust and can stably exist for at least three months; (ii) the third-order nonlinear Hall effect in TaIrTe4 is pronounced and remains sizable and detectable at room temperature. Such room-temperature nonlinear Hall response has never been reported before. Our work will open an avenue towards building room-temperature third-order nonlinear Hall devices based on WSM systems.

RESULTS AND DISCUSSION

Results

Before detecting the nonlinear Hall effect, we first studied the crystal structure and confirmed the Inline graphic structure of the TaIrTe4 crystal via transmission electron microscopy (TEM). TaIrTe4 samples for TEM measurements were prepared via the mechanical exfoliation method by using Scotch tape, then scanning transmission electron microscopy (STEM) was employed to study the microstructures of TaIrTe4. The atomic structure of TaIrTe4 was further confirmed by annular dark-field (ADF) STEM characterization. By comparing the intensity profile of the experimental ADF-STEM image (Fig. 1a) and simulated (Fig. 1b) STEM images, we found that the minimal periodic structure along the b-axis (highlighted by the rectangles in Fig. S1a–c respectively) exhibits identical intensities of each atomic column, confirming the Inline graphic phase of our TaIrTe4, which belongs to the space group Pmn21. Each monolayer of TaIrTe4 consists of a layer of Ta (or Ir) atoms sandwiched between two layers of Te atoms in a distorted octahedral coordination, and multilayer TaIrTe4 is formed by stacking these monolayers with alternating layers rotated by 180o (Fig. 1c and d), which includes a screw axis 21 and a mirror plane ma perpendicular to this axis (Fig. 1c and d). The crystal symmetry is generated by two symmetry generators: a mirror plane ma and a glide mirror nb. The band structures of bulk TaIrTe4 with spin–orbit coupling were calculated, as shown in Fig. S1e.

Figure 1.

Figure 1.

Crystal structure in TaIrTe4. (a) Experimental and (b) simulated TEM images of exfoliated TaIrTe4 flakes, with the a-b plane of the Td -phase crystal structure superimposed, respectively. A mirror plane ma of this structure is also shown in (b). (c) and (d) are the crystal structure of Td-TaIrTe4.

Next, we constructed a device made of Inline graphic-TaIrTe4 and explored its nonlinear Hall effect. To optimize the device for measuring Hall transport, a 161.2 nm thick Inline graphic-TaIrTe4 flake (Fig. S2) with straight and long edges was transferred onto the circular disk device substrate with 12 Au/Cr electrodes, and the device was capped by hexagonal boron nitride (hBN) thin layers (Fig. 2a). Note that the 161.2 nm thick TaIrTe4 can be regarded as a bulk material. This point is important for our later analysis. By constantly applying the alternating current (ac) with fundamental frequency ω = 18.57 Hz to the device along the longitudinal direction under zero magnetic field (the current direction is labeled by the yellow line as shown in Fig. 2a), we measured the transverse voltage Inline graphic (n = 1, 2, 3) directly by a lock-in amplifier (Zurich Instruments) in a phase-sensitive way at 100 K. We can see that the measured linear transverse voltage Inline graphic shows a linear relationship with increasing longitudinal voltage (Inline graphic) and keeps a very small value ∼1% of Inline graphic (Fig. 2b). The linear Hall response should vanish due to the preserved time-reversal symmetry, and the finite value of Inline graphic (∼1% of the Inline graphic) observed here is coming from the anisotropy of the crystal structure (hence the resistivity tensor) and the misalignment of the electrodes with the crystal axes of Td-TaIrTe4 [3], rather than the misalignment between the Hall contacts (Fig. S3). Importantly, along the transverse direction, we can observe not only a second-order voltage Inline graphic, but also a third-order voltage Inline graphic (the magnitudes of Inline graphic and Inline graphic are ∼0.1% of Inline graphic) (Fig. 2c), and Inline graphic and Inline graphic exhibit clear quadratic and cubic relationships with the longitudinal voltage Inline graphic, respectively. Importantly, the third-order voltage Inline graphic is almost four times larger than that of the second-order.

Figure 2.

Figure 2.

Nonlinear Hall effect in Td-TaIrTe4. (a) Optical image of a 12-electrode device with active areas protected by hBN. (b) First-harmonic Inline graphic as a function of Inline graphic at 100 K. (c) Second- and third-harmonic Inline graphic(n = 2, 3) as a function of Inline graphic at 100 K. (d) Third-harmonic Inline graphicas a function of Inline graphic measured at 300 K and the signals were taken from the as prepared and after one month or three months. All measured voltage signals at the transverse direction are perpendicular to the current direction, which is marked in (a).

The suppression of the second-order Hall response is due to the crystal symmetry. As discussed above, although bulk Inline graphic-TaIrTe4 breaks the inversion symmetry, it has a C2z symmetry in its point group, originated from the 21 screw axis along the out-of-plane direction (which connects the atoms in two neighboring layers, see Fig. 1c and d). For the in-plane second-order nonlinear response:

graphic file with name TM0023.gif (1)

where Inline graphic in our case, and Inline graphic is the second-order nonlinear conductivity. Under C2z, the current and the E field would reverse, which suppresses the second-order in-plane response in the bulk of the material. This explains why the second-order signal is weak in our measurement. One also noted that the screw axis 21 is broken at the surfaces of the sample, so the second-order Hall signal we measured should be mainly from the surfaces. Actually, a recent work, ref. [20], studied the relationship between the thickness of TaIrTe4 and the second-order Hall effect, and found enhanced second-order Hall effect in few-layer TaIrTe4. The result is consistent with our analysis here.

Now, let us turn to the third-order nonlinear Hall effect. The value of the third-ordered nonlinear Hall signal at Inline graphic= 0.05 V is four times larger than that of the second-order Hall signal (Fig. 2c). In the general form, the third-order current response can be expressed as

graphic file with name TM0027.gif (2)

where Inline graphic is the third-order nonlinear conductivity. One notes that, distinct from the second order, the C2z symmetry does not forbid the third-order nonlinear Hall effect.

Importantly, the third-order nonlinear Hall effect here is detectable at room temperature (300 K); the material is very stable in air, [32] and the measured third-order nonlinear Hall signal can persist after three months (Fig. 2d). Note that our device fabrication was performed under ambient conditions. We did not observe any degradation of the sample in the process. It is worth noting that the main purpose of encapsulating hBN in our device is to improve the electrical contact between TaIrTe4 and Cr/Au electrodes at low temperature. Our device is fabricated by transferring TaIrTe4 onto prepatterned electrodes; with hBN covering on the sample, good electric contact can be achieved. This is in contrast to WTe2 or MoTe2, where the fabrication has to be done in a vacuum or in inert gas environments and hBN encapsulation is required for protecting these materials [33]. Our conclusion is that the third-order nonlinear Hall effect observed in air-stable TaIrTe4 is very robust, which could pave the way to practical application.

To further characterize this third-order nonlinear Hall effect, we studied the angle dependence of the third-order signal as a function of current direction at 100 K. As shown in Fig. 3a, the fundamental frequency (ω = 18.57 Hz) ac current was applied to the device through a one source electrode (S) to the opposite drain electrode (D). At the same time, we measured the voltage drop between another pair of electrodes at the transverse direction, labeled as A and B, which is the transverse voltage. θ labels the current direction and it is measured from electrode #1 as 0° clockwise (Fig. S3). The angle between two neighboring electrodes is 30°. Signals in different lattice directions were recorded by rotating the measurement frame while keeping the relative positions (S-A-D-B in clockwise order) unchanged. It is worth noting that in the transverse voltage measurement, when we changed the source (S) and drain (D) directions, A and B were also switched to make sure the relative positions (S-A-D-B in clockwise order) were maintained, as shown in Fig. S4. The longitudinal current Inline graphic shows a good linear relationship with longitudinal voltage Inline graphic at all angles (Fig. 3b). The angle dependence of Inline graphic is presented in Fig. 3c (upper panel) as a function of θ. The longitudinal resistances Inline graphic can be expressed as:

graphic file with name TM0033.gif (3)

where Ra and Rb (>Ra) are the resistances along the a- and b-axis, respectively. With this function, we fitted (the red line shown in the upper panels in Fig. 3c) the angle dependence of Inline graphic and found a good agreement with a 2-fold angular dependence. The resistance anisotropy r defined as Ra/Rb is ∼0.1. After fixing the crystal axis orientations, we focused on the third-order signal. As discussed above, the third-order nonlinear transverse voltage Inline graphic shows a cubic relationship with longitudinal voltage Inline graphic (Fig. 3e). It also exhibits a 2-fold angular dependence, as shown in Fig. 3e. At the same time, Inline graphic vanishes at θ ∼0°, 90°, 180°, 270° and 360°, which corresponds to the crystal a- or b-axis (lower panel in Fig. 3c). The angular dependence of the third-order nonlinear response can be well fitted by the formula derived for the Pmn21 symmetry in ref. [26] (also see Fig. S4). The vanishing Inline graphic at specific angles can be readily understood from the following analysis. When the driving current is along the a-axis and the voltage is measured along the b-axis, Inline graphic and Inline graphic accordingly, then under the ma symmetry Inline graphic(Inline graphic) is reversed (invariant), which leads to the vanishing Inline graphic according to Equation (2). Similarly, the nb symmetry also forces the signal to vanish when the driving current is along the b-axis.

Figure 3.

Figure 3.

Angular dependence of the nonlinear Hall effect in Td-TaIrTe4. (a) Electrode geometry for angle-dependent measurements. The driving field is applied between two opposite electrodes, and the voltage drop is measured between the other two opposite electrodes at the transverse direction. By rotating the measurement framework in a clockwise direction as shown by the red arrow, signals of different lattice directions are recorded. (b) First-harmonic I-V curves for different directions in TaIrTe4. (c) The upper panel is Inline graphic as a function of Inline graphic, the black dots are experimental data and the line is fitted to the experimental data. The lower panel is the Inline graphic as a function of Inline graphic, the black dots are experimental data and the red line is the spline of each experimental data set. (d) Inline graphic depends nonlinearly on the first-harmonic Inline graphic for different directions. (e) Inline graphic depends linearly on the cubic of the first-harmonic Inline graphic for different directions. All the tests are implemented at 100 K.

Discussion

According to the conventional semi-classical equations of motion [34], the third-order nonlinear Hall current induced by the Berry curvature can be written as:

graphic file with name TM0044.gif (4)

where τ is the relaxation time of carriers and Inline graphic is the Fermi distribution. The term Inline graphic may be called the Berry curvature quadrupole. However, because Inline graphic is odd under time reversal [Inline graphic], while Inline graphic is even, one finds that Equation (4) vanishes identically for time-reversal invariant systems. In other words, unlike the second-order nonlinear Hall effect, the intrinsic Berry curvature will not contribute to the third-order Hall effect in non-magnetic systems [35].

As shown in refs [26] and [28], the third-order Hall effect has a different origin with the second-order Hall effect, and the former originates from the BCP of the band structure. BCP arises when studying the field corrections to the Berry curvature. Under an applied E field, there is an induced Berry curvature Inline graphic due to the interband mixing [27]:

graphic file with name TM0051.gif (5)

where

graphic file with name TM0052.gif (6)

here G is the BCP tensor, ϵ0 and ϵn are band energies for bands 0 and n, respectively, i and j refer to the spatial components, and (Vi)0n is the interband matrix element of the velocity operator. It is important to note that BCP has symmetry characters that are distinct from the intrinsic Berry curvature. The intrinsic Berry curvature Ω is odd under time reversal and is even under inversion. In comparison, BCP is even under both time reversal and inversion, according to Equation (6). As a result, it can exist in systems that preserve both time reversal and inversion symmetries, and contribute to the third-order Hall effect. Table 1 summarizes the differences between Berry curvature and BCP.

Table 1.

Comparison of the symmetry properties of Berry curvature and BCP.

Berry curvature BCP
Symmetry operation Time reversal Odd Even
Inversion Even Even

Based on the extended semi-classical theory by Gao, Yang and Niu [27,36], the following contribution for the third-order current response has been derived [26,28], which is linear in the relaxation time:

graphic file with name TM0053.gif (7)

Meanwhile, the conventional field driving of electrons in non-magnetic materials also gives a contribution proportional to Inline graphic [28], which may be called the Drude-like term:

graphic file with name TM0055.gif (8)

These two contributions can be separated from a scaling analysis. The temperature dependence of the material's conductivity and the third-order nonlinear response Inline graphic are shown in Fig. 4. Figure 4a (upper panel) shows the angular dependence of the longitudinal resistances Inline graphic (dots) at different temperatures. We can see that the longitudinal resistance Inline graphic increases with temperature. Figure 4a (lower panel) summarizes the angular dependence Inline graphic/Inline graphic at different temperatures as a function of Inline graphic, and the third-order nonlinear response Inline graphic/Inline graphic decreases when the temperature increases from 100 to 300 K. At the same time, the material's longitudinal conductivity σ decreases as the temperature increases from 5 K to 300 K, as shown in Fig. 4b. Next, we focus on the third-order nonlinear response Inline graphic from 5 K to 300 K. As observed at 100 K, Inline graphic depends linearly on Inline graphic at all temperatures (Fig. S4) and the slope of Inline graphic versus Inline graphic (Inline graphic) in TaIrTe4 decreases with temperature (Fig. 4c). We plot Inline graphic versus σ2 as shown in Fig. 4d, which confirms the scaling relation that

graphic file with name TM0071.gif (9)

where Inline graphic and Inline graphic are constants, and Inline graphic. The left-hand side can be rewritten as Inline graphic. Since the longitudinal conductivity Inline graphicdepends linearly on the scattering time Inline graphic, Equation (9) shows that third-order response coefficient (Inline graphic) has two contributions that scale with Inline graphic and Inline graphic, which are consistent with our above analysis. The contribution of the third-order nonlinear coefficient can be divided into the Drude-like and BCP-like parts as shown in Fig. 4e. The fitted parameters for TaIrTe4 are presented in Table S1 in the Inline graphic supplementary data, and are compared with the results for MoTe2 in ref. [26]. It was found that the BCP-like contribution (parameter Inline graphic) in TaIrTe4 is more than two times that of MoTe2, and the Drude-like contribution in TaIrTe4 is also much larger than MoTe2. Since the BCP-like contribution decays with temperature much slower than the Drude-like contribution, the larger BCP-like contribution in TaIrTe4 plays a crucial role in the pronounced third-order Hall effect that remains detectable at room temperature. A detailed analysis of the temperature dependence is presented in Figs S6–S8.

Figure 4.

Figure 4.

Temperature dependence of the nonlinear Hall effect in Td -TaIrTe4. (a) The lower panel is the longitudinal resistance Inline graphic as a function of Inline graphic at different temperatures from 100 to 300 K. The dots are experimental data, and the lines are fitted to the experimental data. The upper panel is the Inline graphic/Inline graphic as a function of Inline graphic with different temperatures from 100 to 300 K, the dots are experimental data and the lines are the splines of each experimental data set. (b) The longitudinal conductivity σ as the function of temperature. (c) The third nonlinear Hall effect Inline graphic/Inline graphic as the function of temperature. (d) Inline graphic with the square of longitudinal conductivity σ. (e) Inline graphic including the Drude-like and BCP-like parts as the function of temperature. For (b), (c) and (d), the signal was taken from the data when the driving current was applied at 30 degree. For (e), the signal was taken from the data when the driving current was applied at 120 degree.

Finally, as discussed, the second-order response is suppressed here by the 21 screw axis in the bulk material, and the remaining signal should be from the surfaces where the screw axis is broken. If one wishes to further suppress the signal, one possible way is to choose a material with a C2z axis instead of a screw. Meanwhile, increasing the sample thickness can also decrease the relative weight of the second-order signal in TaIrTe4.

CONCLUSION

In conclusion, in type-II WSM TaIrTe4, we have revealed a room-temperature third-order nonlinear Hall effect, and found that the third-order signal in TaIrTe4 can persist for at least three months and keep almost the same value at 300 K. The BCP tensor plays an important role in the third-order Hall effect, which is different from both linear and second-order nonlinear Hall effects. These findings will deepen our understanding of the BCP tensor, which is an intrinsic band geometric quantity and plays an important role in the nonlinear phenomena. This work paves the way for possible room-temperature applications based on the third-order nonlinear Hall effect in WSMs.

METHODS

Crystal preparation

TaIrTe4 single crystals were prepared by solid-state reaction using tellurium as flux. Tellurium pieces (99.999%), tantalum powder (99.99%) and iridium powder (99.999%) were purchased from Sigma-Aldrich and were loaded (at an atomic ratio of Te:Ta : Ir = 12 : 1 : 1) into a quartz tube, which was flame sealed under a high vacuum of 10−6 torr. The quartz tube was placed in the tube furnace, slowly heated to 1000°C and left there for 100 h, before being allowed to cool to 600°C at a rate of 0.8°C h–1, then cool further to room temperature. At the end, shiny and needle-like TaIrTe4 single crystals were obtained from the product.

Device fabrication

The TaIrTe4 flakes were mechanically exfoliated from the bulk crystal onto the polydimethylsiloxane and then released onto the SiO2/Si substrate with Cr/Au electrodes. This was followed by the stacking of h-BN on the TaIrTe4. The TaIrTe4 flakes were identified by optical microscopy, and their thickness was measured by an atomic force microscope (AFM). The crystal orientation of TaIrTe4 flakes was first estimated from the flake shape and then determined by angle-dependent measurements.

Electrical measurements

An alternating electric field was applied to the sample, and the voltage drop was recorded by a phase-sensitive lock-in amplifier. The measurement of the angle dependence was performed by rotating the reference frame.

Supplementary Material

nwac020_Supplemental_File

Acknowledgements

We thank D.L. Deng and Shuhui Zhang for discussions regarding the theory section of this article.

Contributor Information

Cong Wang, College of Mathematics and Physics, Beijing University of Chemical Technology, Beijing, 100029, China; Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, 637371, Singapore.

Rui-Chun Xiao, Institute of Physical Science and Information Technology, Anhui University, Hefei, 230601, China.

Huiying Liu, Research Laboratory for Quantum Materials, Singapore University of Technology and Design, Singapore, 487372, Singapore.

Zhaowei Zhang, Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, 637371, Singapore.

Shen Lai, Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, 637371, Singapore.

Chao Zhu, School of Materials Science and Engineering, Nanyang Technological University, Singapore, 639798, Singapore.

Hongbing Cai, Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, 637371, Singapore.

Naizhou Wang, Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, 637371, Singapore.

Shengyao Chen, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, China.

Ya Deng, School of Materials Science and Engineering, Nanyang Technological University, Singapore, 639798, Singapore.

Zheng Liu, School of Materials Science and Engineering, Nanyang Technological University, Singapore, 639798, Singapore.

Shengyuan A Yang, Research Laboratory for Quantum Materials, Singapore University of Technology and Design, Singapore, 487372, Singapore.

Wei-Bo Gao, Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, 637371, Singapore; The Photonics Institute and Centre for Disruptive Photonic Technologies, Nanyang Technological University, Singapore, 637371, Singapore.

FUNDING

This work was supported by the Singapore National Research Foundation through its Competitive Research Program (NRF-CRP21-2018-0007 and NRF-CRP22-2019-0004), the Singapore Ministry of Education (MOE2016-T3-1-006 (S), MOE2017-T2-2-108 and MOE2019-T2-1-001), Fundamental Research Funds for the Central Universities (buctrc202122) and the National Natural Science Foundation of China (11947212).

AUTHOR CONTRIBUTIONS

C.W. and W.B.G. conceived the research idea and supervised the experiments. S.A.Y., H.Y.L. and R.C.X. developed the theoretical model. C.W. fabricated the devices. C.W., Z.W.Z., S.L., H.B.C. and N.Z.W. performed the electrical transport measurements and analyzed the data. C.W. grew the bulk crystals. C.Z., Y.D., S.Y.C. and Z.L. took the TEM and AFM measurements. C.W., R.C.X., H.Y.L., Z.W.Z., W.B.G. and S.A.Y. co-wrote the manuscript. All authors discussed, and offered revisions on, the manuscript.

Conflict of interest statement

None declared.

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